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Analysis of high purity Cu using high sensitivity LA-ICP-Q-MS

Analysis of High Purity Cu Using High Sensitivity LA-ICP-Q-MS

Of all the elements in the periodic table, Copper (Cu) is mined and used on a global scale at a rate behind that of only Aluminium and Iron. Copper is sought for its high electrical and thermal conductivities and is used in all types of wiring applications. Copper is produced at different purity levels, e.g. the standard grade of 99.9% purity all the way up 99.999999% (known as 8N Cu), which is very limited in application because of the expense required to purify it. The world’s Cu suppliers currently use analytical techniques such as Arc-Spark OES and XRF, as well as solution-based conventional ICP-MS to control impurity levels. However, these techniques do not meet the ppb detection limit requirements currently required by Cu consumers.

Technique: Trace Elemental Analysis Resource Type: Application Note
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